产品介绍:
CVI反射镜,是高质量的光学反射镜选择,广泛应用于各类高功率及精密激光应用中。镜片面型精度、镀膜损伤阈值高,坚固耐用并为客户提供优像质。光学误差RMS低于λ/50,表面粗糙度可达3-5Å。
是目前国内高校、研究所及高功率/高性能光学实验室的选!
主要应用:
l 激光谐振腔镜
l 光路偏转
l 各类激光加工设备
产品参数:
类别  | 系列代码  | 波长范围nm  | 反射率  | 直径mm  | 面型精度  | 表面质量  | 损伤阈值  | 
窄带部分反射镜  | PR1  | 190-2100  | 30-90%  | 12.7-50.8  | λ/10  | 10-5  | 20 J/cm2, 20ns, 20Hz   at 1064nm,  | 
窄带可调全反镜  | TLM1  | 190-2100  | R ≥ 99.0% at 0°  | 12.7-101.6  | λ/10  | 10-5  | 20 J/cm2, 20ns, 20Hz   at 1064nm,  | 
光纤全反镜  | FLM  | 343, 515, 1030, 1064,  | R ≥ 99.0% at 0°  | 12.7-50.8  | λ/10  | 10-5  | 20 J/cm2, 20ns, 20Hz   at 1064nm,  | 
准分子全反镜  | ARF  | 193  | R ≥ 97% at 0°  | 25.4-76.2  | λ/10  | 10-5  | 1 J/cm2, 20ns pulse at 193nm  | 
KRF  | 248  | R ≥ 99.5% at 0°  | 25.4-76.2  | λ/10  | 10-5  | 3 J/cm2, 8ns pulse at 248nm  | |
YAG全反镜  | Y5  | 213  | R ≥ 97.0% at 0°  | 12.7-50.8  | λ/10  | 10-5  | 3 J/cm2, 8ns pulse at 248nm  | 
Y4  | 262-266  | R ≥ 99.9% at 0°  | 12.7-101.6  | λ/10  | 10-5  | 10 J/cm2, 20ns, 20Hz at 266nm  | |
Y3  | 349-355  | R ≥ 99.9% at 0°  | 12.7-101.6  | λ/10  | 10-5  | 15 J/cm2, 20ns, 20Hz at 355nm  | |
Y2  | 523-532  | R ≥ 99.9% at 0°  | 12.7-101.6  | λ/10  | 10-5  | 20 J/cm2, 20ns, 20Hz at 532nm  | |
Y1  | 1047-1064  | R ≥ 99.9% at 0°  | 12.7-101.6  | λ/10  | 10-5  | 25 J/cm2, 20ns, 20Hz at 1064nm  | |
Y1S, Y2S, Y3S, Y4S  | 266, 355, 532, 1064  | R ≥ 99.9% at 0°  | 25.4  | λ/10  | 10-5  | 40 J/cm2, 20ns, 20Hz at 1064nm  | |
双波长反射镜  | HM  | 1064/532  | R ≥ 99% at 1064 and 532nm  | 12.7-50.8  | λ/10  | 10-5  | 8 J/cm2, 20ns, 20Hz at   1064nm,  | 
YH  | 1064/633  | R ≥ 99% at 1064nm  | 25.4-50.8  | λ/10  | 10-5  | 8 J/cm2, 20ns pulse at 1064nm  | |
宽带反射镜  | TLM2  | 450nm to 2100nm  | R > 99.5% at 0° incidence  | 12.7-25.4  | λ/10  | 10-5  | 500 mJ/cm2, 20ns, 20Hz at 1064nm  | 
MPQ  | 245 – 390 (UV)  | Ravg≥ 98% from 245 – 390nm at 0° - 45°  | 25.0  | λ/4  | 60-40  | 0.5 J/cm2, 10ns at 532nm  | |
钛宝石超快反射镜  | TLMB  | 740 – 860  | R > 99.0% from 740 – 860nm  | 25.0-101.6  | λ/10  | 40-20  | 8 J/cm2, 300 ps, 20Hz at 800nm  | 
金属镀膜反射镜  | VUVA  | 157 – 190  | R > 85% at 157nm by design  | 25.4-50.8  | λ/10  | 40-20  | 低功率应用  | 
DUVA  | 193 – 1200  | R > 90% at 193nm  | 12.7-50.8  | λ/10  | 40-20  | ||
PAUV  | 250 – 600  | Ravg ≥ 85% (250 – 600nm)  | 12.7-76.2  | λ/10  | 40-20  | ||
PAV  | 400 – 800  | Ravg ≥ 87% (400 – 800nm)  | 12.7-76.2  | λ/10  | 40-20  | ||
EAV  | 450 – 650  | Ravg ≥ 92% (450 – 650nm)  | 12.7-76.2  | λ/10  | 40-20  | ||
PS  | 400 – 20,000  | Ravg ≥ 95% (400nm to 20 µm)  | 12.7-76.2  | λ/10  | 40-20  | ||
PG  | 650 – 20,000  | Ravg ≥ 95.5% (650 – 1700nm)  | 12.7-76.2  | λ/10  | 40-20  |